Reactive magnetron sputtering of Inconel 690 by Ar-N2 plasma
Identifieur interne : 000578 ( Main/Exploration ); précédent : 000577; suivant : 000579Reactive magnetron sputtering of Inconel 690 by Ar-N2 plasma
Auteurs : A. Saker [Algérie] ; H. He [France, République populaire de Chine] ; T. Czerwiec [France] ; X. Li [République populaire de Chine] ; L. Tran Huu [France] ; C. Dong [République populaire de Chine] ; H. Michel [France] ; C. Frantz [France]Source :
- Thin solid films [ 0040-6090 ] ; 2008.
Descripteurs français
- Pascal (Inist)
- Pulvérisation réactive, Dépôt physique phase vapeur, Dépôt pulvérisation, Pulvérisation cathodique, Revêtement, Couche mince métallique, Microstructure, Nanostructure, Réseau cubique, Solution solide, Texture, Effet température, Inconel 690, Nickel, Chrome, Fer, Alliage base nickel, Analyse diffraction RX, Analyse microsonde électronique, Nitrure de chrome, Procédé dépôt, Substrat verre, Substrat acier, CrN, Cr N, Ni, 8115C, 6855N, 6855J.
- Wicri :
English descriptors
- KwdEn :
- Cathode sputtering, Chromium, Chromium nitride, Coatings, Cubic lattices, Deposition process, Electron microprobe analysis, Inconel 690, Iron, Metallic thin films, Microstructure, Nanostructures, Nickel, Nickel base alloys, Physical vapor deposition, Reactive sputtering, Solid solutions, Sputter deposition, Temperature effects, Texture, X-ray diffraction analysis.
Abstract
M and M-N coatings, where M is nearly the metal composition of Inconel 690 (57 at.% Ni, 32 at.% Cr, 9.5 at.% Fe...) were sputter-deposited on glass and steel substrates in pure argon and in Ar-N2 mixtures using a round planar magnetron. The influence of nitrogen gas flow rate inlet in argon on chemical composition and microstructure was studied. The as-deposited (T <100 °C) M-N films containing up to 30 at.% nitrogen are a nanocrystalline supersaturated face cubic centered (fcc) solid solution (γN). The pure metallic films have a pronounced<11 1>fcc crystallographic texture, while the M-N films exhibit a strong<100>fcc crystallographic texture. The effect of temperature on the microstructure of M-N films was studied by increasing the substrate temperature during preparation and by tempering of an as-deposited M-N films. For M-N films prepared at 400 °C, the X-ray diffraction analysis reveals a magnetic y phase with a very low nitrogen content, while electron probe microanalysis gives an overall high nitrogen content in the layer (up to 25 at.%). It is concluded that the layers consist of two phases when prepared or tempered at high temperature (T>400 °C): an fcc CrN nitride and a y (Ni,Fe,Cr) depleted in nitrogen.
Affiliations:
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Li</name><affiliation wicri:level="1"><inist:fA14 i1="03"><s1>State key laboratory for materials modification by laser, ion and electron beams, Dalian University of Technology</s1><s2>Dalian 116024</s2><s3>CHN</s3><sZ>2 aut.</sZ><sZ>4 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>République populaire de Chine</country><wicri:noRegion>Dalian 116024</wicri:noRegion></affiliation></author><author><name sortKey="Huu, L Tran" sort="Huu, L Tran" uniqKey="Huu L" first="L. Tran" last="Huu">L. Tran Huu</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Dong, C" sort="Dong, C" uniqKey="Dong C" first="C." last="Dong">C. Dong</name><affiliation wicri:level="1"><inist:fA14 i1="03"><s1>State key laboratory for materials modification by laser, ion and electron beams, Dalian University of Technology</s1><s2>Dalian 116024</s2><s3>CHN</s3><sZ>2 aut.</sZ><sZ>4 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>République populaire de Chine</country><wicri:noRegion>Dalian 116024</wicri:noRegion></affiliation></author><author><name sortKey="Michel, H" sort="Michel, H" uniqKey="Michel H" first="H." last="Michel">H. Michel</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Frantz, C" sort="Frantz, C" uniqKey="Frantz C" first="C." last="Frantz">C. Frantz</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">INIST</idno><idno type="inist">08-0266643</idno><date when="2008">2008</date><idno type="stanalyst">PASCAL 08-0266643 INIST</idno><idno type="RBID">Pascal:08-0266643</idno><idno type="wicri:Area/PascalFrancis/Corpus">000227</idno><idno type="wicri:Area/PascalFrancis/Curation">000214</idno><idno type="wicri:Area/PascalFrancis/Checkpoint">000212</idno><idno type="wicri:explorRef" wicri:stream="PascalFrancis" wicri:step="Checkpoint">000212</idno><idno type="wicri:doubleKey">0040-6090:2008:Saker A:reactive:magnetron:sputtering</idno><idno type="wicri:Area/Main/Merge">000594</idno><idno type="wicri:Area/Main/Curation">000578</idno><idno type="wicri:Area/Main/Exploration">000578</idno></publicationStmt><sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Reactive magnetron sputtering of Inconel 690 by Ar-N<sub>2</sub> plasma</title><author><name sortKey="Saker, A" sort="Saker, A" uniqKey="Saker A" first="A." last="Saker">A. Saker</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Département de Physique de l'Université Badji Mokhtar, BP 12 El Hadjar</s1><s2>Annaba</s2><s3>DZA</s3><sZ>1 aut.</sZ></inist:fA14><country>Algérie</country><wicri:noRegion>Annaba</wicri:noRegion></affiliation></author><author><name sortKey="He, H" sort="He, H" uniqKey="He H" first="H." last="He">H. He</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation><affiliation wicri:level="1"><inist:fA14 i1="03"><s1>State key laboratory for materials modification by laser, ion and electron beams, Dalian University of Technology</s1><s2>Dalian 116024</s2><s3>CHN</s3><sZ>2 aut.</sZ><sZ>4 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>République populaire de Chine</country><wicri:noRegion>Dalian 116024</wicri:noRegion></affiliation></author><author><name sortKey="Czerwiec, T" sort="Czerwiec, T" uniqKey="Czerwiec T" first="T." last="Czerwiec">T. Czerwiec</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Li, X" sort="Li, X" uniqKey="Li X" first="X." last="Li">X. Li</name><affiliation wicri:level="1"><inist:fA14 i1="03"><s1>State key laboratory for materials modification by laser, ion and electron beams, Dalian University of Technology</s1><s2>Dalian 116024</s2><s3>CHN</s3><sZ>2 aut.</sZ><sZ>4 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>République populaire de Chine</country><wicri:noRegion>Dalian 116024</wicri:noRegion></affiliation></author><author><name sortKey="Huu, L Tran" sort="Huu, L Tran" uniqKey="Huu L" first="L. Tran" last="Huu">L. Tran Huu</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Dong, C" sort="Dong, C" uniqKey="Dong C" first="C." last="Dong">C. Dong</name><affiliation wicri:level="1"><inist:fA14 i1="03"><s1>State key laboratory for materials modification by laser, ion and electron beams, Dalian University of Technology</s1><s2>Dalian 116024</s2><s3>CHN</s3><sZ>2 aut.</sZ><sZ>4 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>République populaire de Chine</country><wicri:noRegion>Dalian 116024</wicri:noRegion></affiliation></author><author><name sortKey="Michel, H" sort="Michel, H" uniqKey="Michel H" first="H." last="Michel">H. Michel</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author><author><name sortKey="Frantz, C" sort="Frantz, C" uniqKey="Frantz C" first="C." last="Frantz">C. Frantz</name><affiliation wicri:level="3"><inist:fA14 i1="02"><s1>Laboratoire de Science et Génie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt</s1><s2>54042 Nancy</s2><s3>FRA</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>5 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ></inist:fA14><country>France</country><placeName><region type="region" nuts="2">Grand Est</region><region type="old region" nuts="2">Lorraine (région)</region><settlement type="city">Nancy</settlement></placeName></affiliation></author></analytic><series><title level="j" type="main">Thin solid films</title><title level="j" type="abbreviated">Thin solid films</title><idno type="ISSN">0040-6090</idno><imprint><date when="2008">2008</date></imprint></series></biblStruct></sourceDesc><seriesStmt><title level="j" type="main">Thin solid films</title><title level="j" type="abbreviated">Thin solid films</title><idno type="ISSN">0040-6090</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Cathode sputtering</term><term>Chromium</term><term>Chromium nitride</term><term>Coatings</term><term>Cubic lattices</term><term>Deposition process</term><term>Electron microprobe analysis</term><term>Inconel 690</term><term>Iron</term><term>Metallic thin films</term><term>Microstructure</term><term>Nanostructures</term><term>Nickel</term><term>Nickel base alloys</term><term>Physical vapor deposition</term><term>Reactive sputtering</term><term>Solid solutions</term><term>Sputter deposition</term><term>Temperature effects</term><term>Texture</term><term>X-ray diffraction analysis</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Pulvérisation réactive</term><term>Dépôt physique phase vapeur</term><term>Dépôt pulvérisation</term><term>Pulvérisation cathodique</term><term>Revêtement</term><term>Couche mince métallique</term><term>Microstructure</term><term>Nanostructure</term><term>Réseau cubique</term><term>Solution solide</term><term>Texture</term><term>Effet température</term><term>Inconel 690</term><term>Nickel</term><term>Chrome</term><term>Fer</term><term>Alliage base nickel</term><term>Analyse diffraction RX</term><term>Analyse microsonde électronique</term><term>Nitrure de chrome</term><term>Procédé dépôt</term><term>Substrat verre</term><term>Substrat acier</term><term>CrN</term><term>Cr N</term><term>Ni</term><term>8115C</term><term>6855N</term><term>6855J</term></keywords><keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Nickel</term><term>Chrome</term><term>Fer</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">M and M-N coatings, where M is nearly the metal composition of Inconel 690 (57 at.% Ni, 32 at.% Cr, 9.5 at.% Fe...) were sputter-deposited on glass and steel substrates in pure argon and in Ar-N<sub>2</sub> mixtures using a round planar magnetron. The influence of nitrogen gas flow rate inlet in argon on chemical composition and microstructure was studied. The as-deposited (T <100 °C) M-N films containing up to 30 at.% nitrogen are a nanocrystalline supersaturated face cubic centered (fcc) solid solution (γ<sub>N</sub>). The pure metallic films have a pronounced<11 1>fcc crystallographic texture, while the M-N films exhibit a strong<100>fcc crystallographic texture. The effect of temperature on the microstructure of M-N films was studied by increasing the substrate temperature during preparation and by tempering of an as-deposited M-N films. For M-N films prepared at 400 °C, the X-ray diffraction analysis reveals a magnetic y phase with a very low nitrogen content, while electron probe microanalysis gives an overall high nitrogen content in the layer (up to 25 at.%). It is concluded that the layers consist of two phases when prepared or tempered at high temperature (T>400 °C): an fcc CrN nitride and a y (Ni,Fe,Cr) depleted in nitrogen.</div></front></TEI><affiliations><list><country><li>Algérie</li><li>France</li><li>République populaire de Chine</li></country><region><li>Grand Est</li><li>Lorraine (région)</li></region><settlement><li>Nancy</li></settlement></list><tree><country name="Algérie"><noRegion><name sortKey="Saker, A" sort="Saker, A" uniqKey="Saker A" first="A." last="Saker">A. Saker</name></noRegion></country><country name="France"><region name="Grand Est"><name sortKey="He, H" sort="He, H" uniqKey="He H" first="H." last="He">H. He</name></region><name sortKey="Czerwiec, T" sort="Czerwiec, T" uniqKey="Czerwiec T" first="T." last="Czerwiec">T. Czerwiec</name><name sortKey="Frantz, C" sort="Frantz, C" uniqKey="Frantz C" first="C." last="Frantz">C. Frantz</name><name sortKey="Huu, L Tran" sort="Huu, L Tran" uniqKey="Huu L" first="L. Tran" last="Huu">L. Tran Huu</name><name sortKey="Michel, H" sort="Michel, H" uniqKey="Michel H" first="H." last="Michel">H. Michel</name></country><country name="République populaire de Chine"><noRegion><name sortKey="He, H" sort="He, H" uniqKey="He H" first="H." last="He">H. He</name></noRegion><name sortKey="Dong, C" sort="Dong, C" uniqKey="Dong C" first="C." last="Dong">C. Dong</name><name sortKey="Li, X" sort="Li, X" uniqKey="Li X" first="X." last="Li">X. Li</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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